On April 8, 2004, Leatherdale, Catherine A.; Schardt, Craig R.; Thompson, D. Scott; Thompson, Wendy L. published a patent.COA of Formula: C15H24O2 The title of the patent was Photolithographic and photochemical fabrication of planar inorganic device. And the patent contained the following:
A method for making an inorganic structure includes: (a) applying a photoreactive composition to a substrate, wherein the composition includes: a reactive species, a photoinitiator system, and a plurality of substantially inorganic colloidal particles, wherein the particles have an average particle size of less than about 300 nm; (b) photopatterning the composition to define a structure; and (c) subjecting the structure to elevated temperature for a time sufficient to pyrolyze the reactive species and to at least partially fuse the particles. The invention allows fabrication of inorganic structures, such as planar waveguides and splitters, using inexpensive solution processing and conventional photopatterning. The invention provides the ability to use photoimageable resins including uniformly dispersed, non-aggregated particles to form high resolution features (micron) with little resolution loss due to scattering. Addition of inorganic particles to the reactive composition allows tailoring of the optical, thermal, mech., and dielec. properties of the composite, while maintaining the speed, easy processing, and flexible chem. provided by the organic components of the composition Following imaging, the completed structure can be left as is, heated to pyrolyze the organic components and leave a substantially inorganic porous structure, or sintered further to leave a substantially inorganic densified structure. The experimental process involved the reaction of 1-((2-Ethylhexyl)oxy)-4-methoxybenzene(cas: 146370-51-6).COA of Formula: C15H24O2
The Article related to planar inorganic structure device fabrication photolithog wavegiude, Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes: Photoresists and Radiation-Sensitive Resists and other aspects.COA of Formula: C15H24O2
Referemce:
Ether – Wikipedia,
Ether | (C2H5)2O – PubChem